ioos offers automated Spray Error Patternation (SEP) system solutions for a wide variety of applications. The patented SEP systems provide not only a unique spray patternation method and metrics, but also a novel measurement set-up. This allows facilitated system calibration and switching between pattern and plume analysis (see video below) compared to conventional diagnostic systems.
Spray Error Patternation systems - Overview
Each SEP system is customized for the particular requirements at no additional cost for the design and includes light sources (i.e., YAG, DPSS lasers, LED's), special optics, and CMOS or CCD sensors. Precise adjustment of light source and detector-to-nozzle distance and synchronized liquid delivery (i.e., actuator) with image acquisition is ensured. The SEP systems can be upgraded with the counter-propagating laser option to minimize for instance multiple light scattering. All instrument components are carefully selected and fine-tuned for the specific requirements to provide innovative and affordable custom solutions. Note that expensive cameras, lasers and collimination optics alone do not always produce the best results.
Measurement rig with counter-propagating laser option spray scanning ( left) and pattern/plume switching (right)
SEP systems for Spray Testing and R&D - Features
ioos’ spray analysis systems are successfully used for the development of novel atomizers and spray processes and for nozzle quality control. Features include:
+ One metric (SEt) provides all relevant spray quality information for improved objectivity and facilitated quality control.
+ Switching between pattern and plume analysis saves time and prevents measurement errors.
+ High quality data acquisition is ensured by using state-of-the art optical equipment (i.e., counter-propagating lasers).
+ Evaluation results exceed current quality guidelines of government agencies, such as the FDA.
SEPPAT systems for Spray Process Analysis and Control - Features
ioos’ on-line Spray Diagnostic instrumentation has a proven track record in monitoring, e.g. critical drug-coating processes, yielding superior process control as well as improved production efficiency and product quality. It is used in the production line of major medical device and pharmaceutical companies. Features of the novel SEPPAT include:
+ Real-time monitoring of the Spray Error (SEt) prevents product scrap and predicts product quality.
+ Setup of an error limit for the SEt metric allows for accurate control of ,i.e, spray size, geometry, COG, and pattern distribution during the entire spray cycle.
+ New insight into production processes by monitoring and controlling size and location of spray errors.
+ Robust and compact measurement rig suited for rough environments for on-line monitoring of pattern and plume.